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The dependence of chemical mechanical polishing residue removal on post-cleaning treatments
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Choi, Jae Gon | - |
| dc.contributor.author | Yoon, Hyo Geun | - |
| dc.contributor.author | Kim, Woo Jin | - |
| dc.contributor.author | Choi, Geun Min | - |
| dc.contributor.author | Song, Young Wook | - |
| dc.contributor.author | Park, Jin-Goo | - |
| dc.date.accessioned | 2021-06-23T18:40:36Z | - |
| dc.date.available | 2021-06-23T18:40:36Z | - |
| dc.date.issued | 2008-00 | - |
| dc.identifier.issn | 1012-0394 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/43064 | - |
| dc.description.abstract | [No abstract available] | - |
| dc.format.extent | 4 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Trans Tech Publications Ltd | - |
| dc.title | The dependence of chemical mechanical polishing residue removal on post-cleaning treatments | - |
| dc.type | Article | - |
| dc.publisher.location | 스위스 | - |
| dc.identifier.doi | 10.4028/www.scientific.net/SSP.134.303 | - |
| dc.identifier.scopusid | 2-s2.0-38549118940 | - |
| dc.identifier.wosid | 000253389300070 | - |
| dc.identifier.bibliographicCitation | Solid State Phenomena, v.134, pp 303 - 306 | - |
| dc.citation.title | Solid State Phenomena | - |
| dc.citation.volume | 134 | - |
| dc.citation.startPage | 303 | - |
| dc.citation.endPage | 306 | - |
| dc.type.docType | Conference Paper | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Engineering | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordAuthor | And defect | - |
| dc.subject.keywordAuthor | Cleaning | - |
| dc.subject.keywordAuthor | CMP process | - |
| dc.subject.keywordAuthor | Dishing effect | - |
| dc.subject.keywordAuthor | Etching rate | - |
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Related Researcher
- Park, Jin Goo
- ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)