Anisotropic resist reflow process simulation for 32 nm node elongated contact holes
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Joon-Min | - |
dc.contributor.author | Kim, Dai-Gyoung | - |
dc.contributor.author | Hong, Joo-Yoo | - |
dc.contributor.author | Oh, Hye-Keun | - |
dc.date.accessioned | 2021-06-23T20:41:47Z | - |
dc.date.available | 2021-06-23T20:41:47Z | - |
dc.date.created | 2021-02-01 | - |
dc.date.issued | 2007-11 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/44280 | - |
dc.description.abstract | In general, it is very hard to correctly predict the elongated contact hole resist reflow process ( CH RRP) due to position shift and pattern size irregularity of RRP, because simple RRP simulator uses isotropic resist flow. Therefore RRP simulator was upgraded which can correctly predict the elongated CH RRP by adding the bulk effect and anisotropic reflow. Optical proximity correction for 32 nm node was also applied to the elongated CH RRP to correctly predict the anisotropic elongated CH. The experimental and simulated CH patterns after RRP were compared and found that the simulator can correctly predict the behavior of complex CH array after RRP. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IEEE | - |
dc.title | Anisotropic resist reflow process simulation for 32 nm node elongated contact holes | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Dai-Gyoung | - |
dc.contributor.affiliatedAuthor | Hong, Joo-Yoo | - |
dc.contributor.affiliatedAuthor | Oh, Hye-Keun | - |
dc.identifier.doi | 10.1109/IMNC.2007.4456119 | - |
dc.identifier.scopusid | 2-s2.0-47349093328 | - |
dc.identifier.bibliographicCitation | Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC, pp.90 - 91 | - |
dc.relation.isPartOf | Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC | - |
dc.citation.title | Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC | - |
dc.citation.startPage | 90 | - |
dc.citation.endPage | 91 | - |
dc.type.rims | ART | - |
dc.type.docType | Conference Paper | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | 32 nm pattern | - |
dc.subject.keywordAuthor | Elongated contact hole | - |
dc.subject.keywordAuthor | Optical proximity correction | - |
dc.subject.keywordAuthor | Resist reflow process | - |
dc.identifier.url | https://ieeexplore.ieee.org/document/4456119 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269 sweetbrain@hanyang.ac.kr
COPYRIGHT © 2021 HANYANG UNIVERSITY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.