Observation of V-shaped defects in the growth of In0.8Al0.2Sb/InSb layers: Temperature and V/III flux ratio dependences
DC Field | Value | Language |
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dc.contributor.author | Kim, Y. H. | - |
dc.contributor.author | Lee, J. Y. | - |
dc.contributor.author | Noh, Y. G. | - |
dc.contributor.author | Kim, M. D. | - |
dc.contributor.author | Kwon, Y. J. | - |
dc.contributor.author | Oh, J. E. | - |
dc.date.accessioned | 2021-06-23T21:05:29Z | - |
dc.date.available | 2021-06-23T21:05:29Z | - |
dc.date.issued | 2006-10 | - |
dc.identifier.issn | 0022-0248 | - |
dc.identifier.issn | 1873-5002 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/44591 | - |
dc.description.abstract | In0.8Al0.2Sb/InSb layers were grown under various growth temperature and V/III flux ratio conditions on semi-insulating (001)oriented GaAs substrates by molecular beam epitaxy. The crystalline qualities of In0.8Al0.2Sb/InSb layers were improved by decreasing the V/III flux ratio at a fixed temperature (380 degrees C) and increasing the growth temperature of the fixed V/III ratio (6). Dislocations were only observed in the In0.8Al0.2Sb/InSb layers grown at the optimal condition. On the other hand, many planar defects, including microtwins, were observed when the In0.8Al0.2Sb/InSb layers were grown in the Sb-rich condition. Specifically, V-shaped defects drawn boundaries in the microtwins were observed in the In0.8Al0.2Sb/InSb layer. (c) 2006 Elsevier B.V. All rights reserved. | - |
dc.format.extent | 6 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | ELSEVIER | - |
dc.title | Observation of V-shaped defects in the growth of In0.8Al0.2Sb/InSb layers: Temperature and V/III flux ratio dependences | - |
dc.type | Article | - |
dc.publisher.location | 네델란드 | - |
dc.identifier.doi | 10.1016/j.jcrysgro.2006.08.007 | - |
dc.identifier.scopusid | 2-s2.0-33749862502 | - |
dc.identifier.wosid | 000241884200011 | - |
dc.identifier.bibliographicCitation | JOURNAL OF CRYSTAL GROWTH, v.296, no.1, pp 75 - 80 | - |
dc.citation.title | JOURNAL OF CRYSTAL GROWTH | - |
dc.citation.volume | 296 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 75 | - |
dc.citation.endPage | 80 | - |
dc.type.docType | Article | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Crystallography | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Crystallography | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | GAAS SUBSTRATE | - |
dc.subject.keywordPlus | INSB FILMS | - |
dc.subject.keywordPlus | SUPERLATTICES | - |
dc.subject.keywordPlus | EPITAXY | - |
dc.subject.keywordPlus | QUALITY | - |
dc.subject.keywordPlus | GASB | - |
dc.subject.keywordAuthor | defects | - |
dc.subject.keywordAuthor | molecular beam epitaxy | - |
dc.subject.keywordAuthor | antimonide | - |
dc.subject.keywordAuthor | semiconducting III-V materials | - |
dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0022024806007706?via%3Dihub | - |
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