ICP-CVD 방법으로 합성된 탄소 나노튜브의 구조적 물성 및 전계방출 특성에 촉매의 전처리 공정이 미치는 영향

Abstract

증착된 Ni 촉매의 표면을 플라즈마 전처리하고, 유도결합화학기상증착 방법으로 탄소나노튜브를 성장시켜, 전처리 조건이 탄소나노튜브의 구조적 물성 및 전계방출특성에 미치는 영향을 체계적으로 분석.

Carbon nanotubes [CNTs] are grown on TiN-coated Si substrates at 700∘C by inductively coupled plasma-chemical vapor deposition (ICP-CVD). Pre-treatment of Ni catalysts has been performed using an RF magnetron sputtering system. Structural properties and field-emission characteristics of the CNTs grown are analyzed in terms of the RF power applied and the treatment time used in the pre-treatment process. The characterization using various techniques, such as FE-SEM, AFM, and Raman spectroscopy, show that the physical dimension as well as the crystal quality of CNTs are changed by pre-treatment of Ni catalysts. It is also seen that Ni catalysts with proper grain size and uniform surface roughness may produce much better electron emission. The physical reason for all the measured data obtained are discussed to establish the relationship between the structural property and the electron emission characteristic of CNTs.