Application of data mining for improving yield in wafer fabrication system
- Authors
- Baek, Dong Hyun; Jeong, In-Jae; Han, Chang Hee
- Issue Date
- May-2005
- Publisher
- SPRINGER-VERLAG BERLIN
- Keywords
- Control Chart; Data Mining Technique; Process Capability Index; Wafer Fabrication; Statistical Quality Control
- Citation
- COMPUTATIONAL SCIENCE AND ITS APPLICATIONS - ICCSA 2005, VOL 4, PROCEEDINGS, v.3483, no.4, pp.222 - 231
- Indexed
- OTHER
- Journal Title
- COMPUTATIONAL SCIENCE AND ITS APPLICATIONS - ICCSA 2005, VOL 4, PROCEEDINGS
- Volume
- 3483
- Number
- 4
- Start Page
- 222
- End Page
- 231
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/46162
- DOI
- 10.1007/11424925_25
- ISSN
- 0302-9743
- Abstract
- This paper presents a comprehensive and successful application of data mining methodologies to improve wafer yield in a semiconductor wafer fabrication system. To begin with, this paper applies a clustering method to automatically identify AUF (Area Uniform Failure) phenomenon from data instead of visual inspection that bad chips occurs in a specific area of wafer. Next, sequential pattern analysis and classification methods are applied to find out machines and parameters that are cause of low yield, respectively. Finally, this paper demonstrates an information system, Y2R-PLUS (Yield Rapid Ramp-up, Prediction, analysis & Up Support) that is developed in order to analyze wafer yield in a Korea semiconductor manufacturer.
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