Modification and optimization from a 193-nm ArF to a 157-nm F-2 excimer laser
- Authors
- Park, Seung-Wook; Oh, Hye-Keun
- Issue Date
- Sep-2003
- Publisher
- 한국물리학회
- Keywords
- hyperfine-structure; Sm
- Citation
- Journal of the Korean Physical Society, v.43, no.3, pp 431 - 432
- Pages
- 2
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- Journal of the Korean Physical Society
- Volume
- 43
- Number
- 3
- Start Page
- 431
- End Page
- 432
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/46664
- ISSN
- 0374-4884
1976-8524
- Abstract
- The minimum line width of an information device is getting smaller and smaller, and this reduction in the minimum feature size is mainly possible due to a reduction in the source wavelength. The ArF (193 nm) excimer laser will be replaced by a F-2 (157 nm) excimer laser as a source of next generation devices. We remodeled and optimized our 193-nm ArF excimer laser to a 157-nm F-2 excimer laser by changing the gas mixture and the optics. A large stable laser energy could be obtained with the optimized gas mixture and discharge voltage. An energy increase of about 50 % was possible by using optics optimized for 157-nm. Instead of conventional helium gas, neon gas was tested as the buffer gas, and the same energy was obtained.
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