Wafer-scale MoS2 monolayer growth on SiO2 substrate by modified atomic layer deposition technique
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 박태주 | - |
dc.date.accessioned | 2021-06-22T11:44:45Z | - |
dc.date.available | 2021-06-22T11:44:45Z | - |
dc.date.issued | 2018-12-27 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/5927 | - |
dc.title | Wafer-scale MoS2 monolayer growth on SiO2 substrate by modified atomic layer deposition technique | - |
dc.type | Conference | - |
dc.citation.conferenceName | Atomic Craft and Interfaces Workshop | - |
dc.citation.conferencePlace | 부산 해운대 그랜드 호텔 | - |
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