Tungsten passivation layer (WO3) formation mechanisms during chemical mechanical planarization in the presence of oxidizers
DC Field | Value | Language |
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dc.contributor.author | Poddar, Maneesh Kumar | - |
dc.contributor.author | Jalalzai, Palwasha | - |
dc.contributor.author | Sahir, Samrina | - |
dc.contributor.author | Yerriboina, Nagendra Prasad | - |
dc.contributor.author | Kim, Tae Gon | - |
dc.contributor.author | Park, Jin-Goo | - |
dc.date.accessioned | 2021-06-22T04:44:15Z | - |
dc.date.available | 2021-06-22T04:44:15Z | - |
dc.date.created | 2021-01-22 | - |
dc.date.issued | 2021-01 | - |
dc.identifier.issn | 0169-4332 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/682 | - |
dc.description.abstract | Effects of single and mixed oxidants of Fe(NO3)3 and H2O2 containing acidic silica slurries were studied to investigate the mechanism of tungsten (W) chemical mechanical planarization (CMP). The W polishing rate obtained from the CMP test depicted high W polishing rate in the presence of mixed oxidants of Fe(NO3)3 and H2O2 as compared to a single oxidant of either H2O2 or Fe(NO3)3. The formation of a passive layer of tungsten oxide (WO3) and W dissolution could be the reason for these results as confirmed by XPS. Further investigation revealed that the generation of much stronger oxidants of hydroxyl radicals ([rad]OH) was solely responsible for WO3 layer formation. Quantitative evaluation of [rad]OH generation was estimated using a UV–visible spectrophotometer and confirmed that in-situ generation of hydroxyl radicals ([rad]OH) could be a main driving force for the high W polishing rate by converting a hard W film into a soft passive film of WO3. WO3 film formation was further confirmed using potentiodynamic polarization studies, which showed a smaller value of corrosion current density (Icorr) in mixed oxidants of Fe(NO3)3 and H2O2 as compared to the large values of Icorr observed for H2O2 alone. This study revealed that a single oxidizer of either Fe(NO3)3 or H2O2 was not capable of achieving a high W removal rate. Rather, only mixed oxidants of Fe(NO3)3 and H2O2 could cause a high W polishing rate due to excessive in-situ generation of [rad]OH radicals during the W CMP process. © 2020 | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | Elsevier BV | - |
dc.title | Tungsten passivation layer (WO3) formation mechanisms during chemical mechanical planarization in the presence of oxidizers | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Park, Jin-Goo | - |
dc.identifier.doi | 10.1016/j.apsusc.2020.147862 | - |
dc.identifier.scopusid | 2-s2.0-85091095649 | - |
dc.identifier.wosid | 000582798700041 | - |
dc.identifier.bibliographicCitation | Applied Surface Science, v.537, pp.1 - 8 | - |
dc.relation.isPartOf | Applied Surface Science | - |
dc.citation.title | Applied Surface Science | - |
dc.citation.volume | 537 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 8 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | Free radicals | - |
dc.subject.keywordPlus | Oxidants | - |
dc.subject.keywordPlus | Passivation | - |
dc.subject.keywordPlus | Polishing | - |
dc.subject.keywordPlus | Silica | - |
dc.subject.keywordPlus | Tungsten compounds | - |
dc.subject.keywordPlus | Corrosion current densities | - |
dc.subject.keywordPlus | Formation mechanism | - |
dc.subject.keywordPlus | Hydroxyl radicals | - |
dc.subject.keywordPlus | Passivation layer | - |
dc.subject.keywordPlus | Potentiodynamic polarization studies | - |
dc.subject.keywordPlus | Quantitative evaluation | - |
dc.subject.keywordPlus | Situ generation | - |
dc.subject.keywordPlus | Visible spectrophotometers | - |
dc.subject.keywordPlus | Iron compounds | - |
dc.subject.keywordAuthor | Fe(NO3)3 | - |
dc.subject.keywordAuthor | H2O2 | - |
dc.subject.keywordAuthor | Hydroxyl radicals | - |
dc.subject.keywordAuthor | Surface oxide layer | - |
dc.subject.keywordAuthor | W CMP | - |
dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0169433220326192?via%3Dihub | - |
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