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Wafer-scale MoS2 monolayer growth on SiO2 substrate by modified atomic layer deposition technique

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dc.contributor.author박태주-
dc.date.accessioned2021-06-22T12:24:37Z-
dc.date.available2021-06-22T12:24:37Z-
dc.date.issued2018-08-27-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/7041-
dc.titleWafer-scale MoS2 monolayer growth on SiO2 substrate by modified atomic layer deposition technique-
dc.typeConference-
dc.citation.conferenceNameINPEC 2018-
dc.citation.conferencePlace대한민국/이화여자대학교-
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COLLEGE OF ENGINEERING SCIENCES > DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING > 2. Conference Papers

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Park, Tae Joo
ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)
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