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Area-selective atomic layer deposition using inkjet-printed fluorocarbon patterns as mask layers
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Cho, Youngin | - |
| dc.contributor.author | Yu, Jun ho | - |
| dc.contributor.author | Yoon, Dai geon | - |
| dc.contributor.author | Park, Jin-Goo | - |
| dc.contributor.author | Choi, Kyung hyun | - |
| dc.contributor.author | Lee, Sang ho | - |
| dc.date.accessioned | 2021-06-22T13:02:40Z | - |
| dc.date.available | 2021-06-22T13:02:40Z | - |
| dc.date.issued | 2018-05 | - |
| dc.identifier.issn | 0097-966X | - |
| dc.identifier.issn | 2168-0159 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/7925 | - |
| dc.description.abstract | This study introduces area‐selective atomic layer deposition (AS‐ALD) using fluorocarbon (FC) mask patterns with low surface energy. FC mask patterns were formed on a glass substrate by inkjet printing method. The surface energy of the printed FC thin film was 13.04 dyne/cm enough low to inhibit nucleation and growth during ALD. 10 µm wide Al2O3 patterns were selectively formed by removal of FC mask patterns using oxygen plasma after Al2O3 ALD processes. © 2018, Blackwell Publishing Ltd. All rights reserved. | - |
| dc.format.extent | 4 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Blackwell Publishing Ltd | - |
| dc.title | Area-selective atomic layer deposition using inkjet-printed fluorocarbon patterns as mask layers | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1002/sdtp.12232 | - |
| dc.identifier.scopusid | 2-s2.0-85054029233 | - |
| dc.identifier.bibliographicCitation | Digest of Technical Papers - SID International Symposium, v.49, no.1, pp 1478 - 1481 | - |
| dc.citation.title | Digest of Technical Papers - SID International Symposium | - |
| dc.citation.volume | 49 | - |
| dc.citation.number | 1 | - |
| dc.citation.startPage | 1478 | - |
| dc.citation.endPage | 1481 | - |
| dc.type.docType | Conference Paper | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.subject.keywordPlus | Alumina | - |
| dc.subject.keywordPlus | Aluminum oxide | - |
| dc.subject.keywordPlus | Atoms | - |
| dc.subject.keywordPlus | Fluorocarbons | - |
| dc.subject.keywordPlus | Ink jet printing | - |
| dc.subject.keywordPlus | Interfacial energy | - |
| dc.subject.keywordPlus | Masks | - |
| dc.subject.keywordPlus | Substrates | - |
| dc.subject.keywordPlus | Area selective | - |
| dc.subject.keywordPlus | Glass substrates | - |
| dc.subject.keywordPlus | Ink-jet printing method | - |
| dc.subject.keywordPlus | Low surface energy | - |
| dc.subject.keywordPlus | Mask layer | - |
| dc.subject.keywordPlus | Mask patterns | - |
| dc.subject.keywordPlus | Nucleation and growth | - |
| dc.subject.keywordPlus | Oxygen plasmas | - |
| dc.subject.keywordPlus | Atomic layer deposition | - |
| dc.subject.keywordAuthor | Area-selective Atomic Layer Deposition (AS-ALD) | - |
| dc.subject.keywordAuthor | Fluorocarbon | - |
| dc.subject.keywordAuthor | Inkjet Printing | - |
| dc.subject.keywordAuthor | Mask Pattern | - |
| dc.identifier.url | https://sid.onlinelibrary.wiley.com/doi/10.1002/sdtp.12232 | - |
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Related Researcher
- Park, Jin Goo
- ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)