Spalling of Thin Si Layer via Electroless and Electrodeposit-Assisted Stripping (E(2)AS) with All-Wet Process for Fabrication of Low-Cost Flexible Single-Crystalline Si Solar Cell
DC Field | Value | Language |
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dc.contributor.author | Yang, Changyol | - |
dc.contributor.author | Moon, Kyounghoon | - |
dc.contributor.author | Song, Jae-Won | - |
dc.contributor.author | Kim, Jiwon | - |
dc.contributor.author | Lee, Jung-Ho | - |
dc.contributor.author | Lim, Jae-Hong | - |
dc.contributor.author | Yoo, Bongyoung | - |
dc.date.accessioned | 2021-06-22T13:03:52Z | - |
dc.date.available | 2021-06-22T13:03:52Z | - |
dc.date.created | 2021-01-21 | - |
dc.date.issued | 2018-04 | - |
dc.identifier.issn | 0013-4651 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/8003 | - |
dc.description.abstract | A novel method using an all-wet process to reduce the cost of material in Si-based devices is described, called the electroless and electrodeposit-assisted stripping (E(2)AS) process. In this approach, a highly adhesive electroless Ni nanorod seed layer is formed on the Si substrate in place of a conventional high-cost physical vapor deposition (PVD) process. Then, a highly stressed Ni film is electrodeposited as the stress layer for lift-off of the Si thin film. Using the E2AS method, a thin Si film can be repetitively detached from a Si substrate without kerf loss, reducing the solar cell manufacturing cost. (C) 2018 The Electrochemical Society. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | Electrochemical Society, Inc. | - |
dc.title | Spalling of Thin Si Layer via Electroless and Electrodeposit-Assisted Stripping (E(2)AS) with All-Wet Process for Fabrication of Low-Cost Flexible Single-Crystalline Si Solar Cell | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Jung-Ho | - |
dc.contributor.affiliatedAuthor | Yoo, Bongyoung | - |
dc.identifier.doi | 10.1149/2.1341805jes | - |
dc.identifier.scopusid | 2-s2.0-85046699298 | - |
dc.identifier.wosid | 000431803900083 | - |
dc.identifier.bibliographicCitation | Journal of the Electrochemical Society, v.165, no.5, pp.D243 - D249 | - |
dc.relation.isPartOf | Journal of the Electrochemical Society | - |
dc.citation.title | Journal of the Electrochemical Society | - |
dc.citation.volume | 165 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | D243 | - |
dc.citation.endPage | D249 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Electrochemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Electrochemistry | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordPlus | ACTIVATION | - |
dc.subject.keywordPlus | DEPOSITION | - |
dc.subject.keywordPlus | EFFICIENCY | - |
dc.subject.keywordPlus | STRESS | - |
dc.subject.keywordAuthor | SILICON | - |
dc.subject.keywordAuthor | FILMS | - |
dc.subject.keywordAuthor | ACTIVATION | - |
dc.subject.keywordAuthor | DEPOSITION | - |
dc.subject.keywordAuthor | EFFICIENCY | - |
dc.subject.keywordAuthor | STRESS | - |
dc.subject.keywordAuthor | ectrodeposition | - |
dc.subject.keywordAuthor | solar cell | - |
dc.subject.keywordAuthor | thin Si layer | - |
dc.identifier.url | https://iopscience.iop.org/article/10.1149/2.1341805jes | - |
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