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Oxygen plasma reactive ion etching of tetrahedral amorphous carbon
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Park, JS
; Milne, WI
Article
Issue Date
1996
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, v.35, no.12A, pp.L1550 - L1553
Publisher
JAPAN SOC APPLIED PHYSICS
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PARK, JIN SEOK
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Milne, WI
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filtered cathodic vacuum arc
1
oxygen plasma
1
reactive ion etching
1
substrate bias
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tetrahedral amorphous carbon
1
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English
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Japanese Journal of Applied Physics
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