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Efficient Si/SiOx/ITO Heterojunction Photoanode with an Amorphous and Porous NiOOH Catalyst formed by NiCl2 activation for Water Oxidation

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dc.contributor.authorYoon, Sanghwa-
dc.contributor.authorLim, Jae-Hong-
dc.contributor.authorYoo, Bongyoung-
dc.date.accessioned2021-06-22T14:03:48Z-
dc.date.available2021-06-22T14:03:48Z-
dc.date.issued2017-05-
dc.identifier.issn0013-4686-
dc.identifier.issn1873-3859-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/9599-
dc.description.abstractSolar-driven water splitting with silicon photoelectrodes exhibiting high solar-to-fuel conversion efficiency is a promising way for producing hydrogen fuel in the future. In this study, a heterojunction photoanode was fabricated by the deposition of a thin indium tin oxide (ITO) layer on n-type silicon/native SiOx. A NiCl2-containing precursor was sprayed on the top of the photoanode, affording a NiO-Cl-OH catalyst; this NiO-Cl-OH catalyst was then activated to form an amorphous and porous NiOOH (a-NiOOH) catalyst, which exhibited enhanced performance. The fabricated Si/SiOx/ITO/a-NiOOH photoanode exhibited a low photocurrent onset potential of similar to 0.98 V vs. RHE, a high saturation photocurrent density of 36.98 mA/cm(2), a photocurrent density of 27.4 mA/cm(2) at the standard oxidation potential of water, and a photovoltage as high as 545 mV under a solar illumination of 100 mW/cm(2). The photocurrent marginally decreased after 30 h. These results suggested that such heterojunctions can replace homogeneous p-n junctions formed from Si doping for high photovoltage generation. In addition, porous a-NiOOH can improve the electrocatalytic performance of Si-based photoanodes. (C) 2017 Elsevier Ltd. All rights reserved.-
dc.format.extent7-
dc.language영어-
dc.language.isoENG-
dc.publisherPergamon Press Ltd.-
dc.titleEfficient Si/SiOx/ITO Heterojunction Photoanode with an Amorphous and Porous NiOOH Catalyst formed by NiCl2 activation for Water Oxidation-
dc.typeArticle-
dc.publisher.location영국-
dc.identifier.doi10.1016/j.electacta.2017.03.146-
dc.identifier.scopusid2-s2.0-85017185658-
dc.identifier.wosid000401112200005-
dc.identifier.bibliographicCitationElectrochimica Acta, v.237, pp 37 - 43-
dc.citation.titleElectrochimica Acta-
dc.citation.volume237-
dc.citation.startPage37-
dc.citation.endPage43-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaElectrochemistry-
dc.relation.journalWebOfScienceCategoryElectrochemistry-
dc.subject.keywordPlusLAYERED DOUBLE HYDROXIDE-
dc.subject.keywordPlusSILICON-
dc.subject.keywordPlusEVOLUTION-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusMORPHOLOGY-
dc.subject.keywordPlusPROTECTION-
dc.subject.keywordPlusFILMS-
dc.subject.keywordAuthorSilicon-silicon oxide-indium tin oxide-
dc.subject.keywordAuthorheterojunction-
dc.subject.keywordAuthorNickel chloride activation-
dc.subject.keywordAuthorSpray deposition-
dc.subject.keywordAuthorActive nickel-based catalyst-
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S0013468617306291?via%3Dihub-
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ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)
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