인-라인 마그네트론 스퍼터링 방법에 의한 고전도성 ITO/Ag/i-ZnO 투명전극High Conductive Transparent Electrode of ITO/Ag/i-ZnO by In-Line Magnetron Sputtering Method
- Other Titles
- High Conductive Transparent Electrode of ITO/Ag/i-ZnO by In-Line Magnetron Sputtering Method
- Authors
- 김성용; 권상직
- Issue Date
- 2015
- Publisher
- 한국반도체디스플레이기술학회
- Keywords
- ITO/Ag/i-ZnO; ITO; Ag; Sputtering; Sheet Resistance
- Citation
- 반도체디스플레이기술학회지, v.14, no.3, pp.33 - 36
- Journal Title
- 반도체디스플레이기술학회지
- Volume
- 14
- Number
- 3
- Start Page
- 33
- End Page
- 36
- URI
- https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/11784
- ISSN
- 1738-2270
- Abstract
- It has increased several decades in the field of Indium Tin Oxide (ITO) transparent thin film, However, a major problem with this ITO thin film application is high cost compared with other transparent thin film materials[1]. So far, in order to overcome this disadvantage, we show that a transparent ITO/Ag/i-ZnO multilayer thin film electrode would be more cost-effective and it has not only highly transparent but also conductive properties. The aim of this research has therefore been to try and establish how ITO/Ag/i-ZnO multilayer thin film would be more effective than ITO thin film. Herein, we report the properties of ITO/Ag/i-ZnO multilayer thin film by using optical spectroscopic method and measuring sheet resistance. At a certain total thickness of thin film, sheet resistance of ITO/Ag/i-ZnO multilayer was drastically decreased than ITO layer approximately 40Ω/□ at same visible light transmittance. (minimal point 5.2 Ω/□). Tendency, which shows lowly sheet resistive in a certain transmittance, has been observed, hence, it should be suitable for transparent electrode device.
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Collections - IT융합대학 > 전자공학과 > 1. Journal Articles
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