Simulation study on effect of drain underlap in gate-all-around tunneling field-effect transistors
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dc.contributor.author | Lee, Jae Sung | - |
dc.contributor.author | Seo, Jae Hwa | - |
dc.contributor.author | Cho, Seongjae | - |
dc.contributor.author | Lee, Jung-Hee | - |
dc.contributor.author | Kang, Shin-Won | - |
dc.contributor.author | Bae, Jin-Hyuk | - |
dc.contributor.author | Cho, Eou-Sik | - |
dc.contributor.author | Kang, In Man | - |
dc.date.available | 2020-02-28T23:42:58Z | - |
dc.date.created | 2020-02-06 | - |
dc.date.issued | 2013-08 | - |
dc.identifier.issn | 1567-1739 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/14376 | - |
dc.description.abstract | In this work, the effects of underlapping drain junction on the performances of gate-all-around (GAA) tunneling field-effect transistors (TFETs) have been studied in terms of direct-current (DC) characteristics including on-current (I-on), off-current (I-off), subthreshold swing (S), and I-on/I-off ratio. In addition, the dependences of intrinsic delay time (tau) and radio-frequency (RF) performances including cut-off frequency (f(T)) and maximum oscillation frequency (f(max)) on gate-drain capacitance (C-gd) with the underlapping were investigated as the gate length (L-gate) is scaled. A GAA TFET with asymmetric junctions, with an underlap at the drain side, demonstrated DC and RF performances superior to those of a device with symmetric junctions. (C) 2013 Elsevier B.V. All rights reserved. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.relation.isPartOf | CURRENT APPLIED PHYSICS | - |
dc.subject | DESIGN | - |
dc.subject | TFETS | - |
dc.title | Simulation study on effect of drain underlap in gate-all-around tunneling field-effect transistors | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.description.journalClass | 1 | - |
dc.identifier.wosid | 000318568800034 | - |
dc.identifier.doi | 10.1016/j.cap.2013.03.012 | - |
dc.identifier.bibliographicCitation | CURRENT APPLIED PHYSICS, v.13, no.6, pp.1143 - 1149 | - |
dc.identifier.kciid | ART001794022 | - |
dc.identifier.scopusid | 2-s2.0-84877577578 | - |
dc.citation.endPage | 1149 | - |
dc.citation.startPage | 1143 | - |
dc.citation.title | CURRENT APPLIED PHYSICS | - |
dc.citation.volume | 13 | - |
dc.citation.number | 6 | - |
dc.contributor.affiliatedAuthor | Cho, Eou-Sik | - |
dc.type.docType | Article | - |
dc.subject.keywordAuthor | Gate-all-around (GAA) | - |
dc.subject.keywordAuthor | Tunneling field-effect transistor (TFET) | - |
dc.subject.keywordAuthor | Radio-frequency (RF) | - |
dc.subject.keywordAuthor | Asymmetric junctions | - |
dc.subject.keywordAuthor | Drain underlap | - |
dc.subject.keywordPlus | DESIGN | - |
dc.subject.keywordPlus | TFETS | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
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