Detailed Information

Cited 38 time in webofscience Cited 41 time in scopus
Metadata Downloads

Simulation study on effect of drain underlap in gate-all-around tunneling field-effect transistors

Full metadata record
DC Field Value Language
dc.contributor.authorLee, Jae Sung-
dc.contributor.authorSeo, Jae Hwa-
dc.contributor.authorCho, Seongjae-
dc.contributor.authorLee, Jung-Hee-
dc.contributor.authorKang, Shin-Won-
dc.contributor.authorBae, Jin-Hyuk-
dc.contributor.authorCho, Eou-Sik-
dc.contributor.authorKang, In Man-
dc.date.available2020-02-28T23:42:58Z-
dc.date.created2020-02-06-
dc.date.issued2013-08-
dc.identifier.issn1567-1739-
dc.identifier.urihttps://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/14376-
dc.description.abstractIn this work, the effects of underlapping drain junction on the performances of gate-all-around (GAA) tunneling field-effect transistors (TFETs) have been studied in terms of direct-current (DC) characteristics including on-current (I-on), off-current (I-off), subthreshold swing (S), and I-on/I-off ratio. In addition, the dependences of intrinsic delay time (tau) and radio-frequency (RF) performances including cut-off frequency (f(T)) and maximum oscillation frequency (f(max)) on gate-drain capacitance (C-gd) with the underlapping were investigated as the gate length (L-gate) is scaled. A GAA TFET with asymmetric junctions, with an underlap at the drain side, demonstrated DC and RF performances superior to those of a device with symmetric junctions. (C) 2013 Elsevier B.V. All rights reserved.-
dc.language영어-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE BV-
dc.relation.isPartOfCURRENT APPLIED PHYSICS-
dc.subjectDESIGN-
dc.subjectTFETS-
dc.titleSimulation study on effect of drain underlap in gate-all-around tunneling field-effect transistors-
dc.typeArticle-
dc.type.rimsART-
dc.description.journalClass1-
dc.identifier.wosid000318568800034-
dc.identifier.doi10.1016/j.cap.2013.03.012-
dc.identifier.bibliographicCitationCURRENT APPLIED PHYSICS, v.13, no.6, pp.1143 - 1149-
dc.identifier.kciidART001794022-
dc.identifier.scopusid2-s2.0-84877577578-
dc.citation.endPage1149-
dc.citation.startPage1143-
dc.citation.titleCURRENT APPLIED PHYSICS-
dc.citation.volume13-
dc.citation.number6-
dc.contributor.affiliatedAuthorCho, Eou-Sik-
dc.type.docTypeArticle-
dc.subject.keywordAuthorGate-all-around (GAA)-
dc.subject.keywordAuthorTunneling field-effect transistor (TFET)-
dc.subject.keywordAuthorRadio-frequency (RF)-
dc.subject.keywordAuthorAsymmetric junctions-
dc.subject.keywordAuthorDrain underlap-
dc.subject.keywordPlusDESIGN-
dc.subject.keywordPlusTFETS-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
Files in This Item
There are no files associated with this item.
Appears in
Collections
IT융합대학 > 전자공학과 > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Cho, Eou Sik photo

Cho, Eou Sik
반도체대학 (반도체·전자공학부)
Read more

Altmetrics

Total Views & Downloads

BROWSE