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Active layer thickness effects on the structural and electrical properties of p-type Cu2O thin-film transistors

Authors
Nam, Dong-WooCho, In-TakLee, Jong-HoCho, Eou-SikSohn, JoonsungSong, Sang-HunKwon, Hyuck-In
Issue Date
Nov-2012
Publisher
A V S AMER INST PHYSICS
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.30, no.6
Journal Title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume
30
Number
6
URI
https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/16030
DOI
10.1116/1.4764110
ISSN
2166-2746
Abstract
The authors investigated the effects of active layer thickness on the structual, optical, and electrical characteristics of p-type Cu2O thin-film transistors (TFTs). It was observed that as the channel thickness increases, the average grain size and root mean square roughness of the Cu2O thin films increase, but the optical transmittance notably decreases, especially in the short wavelength range below 500 nm. The p-type Cu2O TFT device exhibits the cleanest transfer function with only a small subthreshold slope when the channel thickness is 45 nm, whereas notable subthreshold slope humps are observed in the transfer curves for devices with thicker channels. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4764110]
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Cho, Eou Sik
반도체대학 (반도체·전자공학부)
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