Effect of substrate temperature on the properties of AZO thin film deposited by using facing targets sputtering system

Abstract

Al doped ZnO (AZO) thin film was deposited by using Facing Target Sputtering (FTS) system. This work examined the properties of AZO thin film as a function of the substrate temperature. The sputtering targets were 4 inch diameter disks of AZO (ZnO: Al2O3=98:2 wt.% ). The properties of electrical, structural and optical were investigated by 4-point probe, Hall effect measurement, x-ray diffractometer (XRD), field-emitting scanning electron microscopy (FE-SEM), and UV/VIS spectrometer. The lowest resistivity of films was 5.67ⅹ10-4 Ω.cm and the average optical transmittance of the films was above 85% in the visible range.