Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Effect of substrate temperature on the properties of AZO thin film deposited by using facing targets sputtering system
- Issue Date
- 2012
- Publisher
- 한국반도체디스플레이기술학회
- Keywords
- AZO; Substrate temperature; Facing targets sputtering
- Citation
- 반도체디스플레이기술학회지, v.11, no.1, pp.1 - 5
- Journal Title
- 반도체디스플레이기술학회지
- Volume
- 11
- Number
- 1
- Start Page
- 1
- End Page
- 5
- ISSN
- 1738-2270
- Abstract
- Al doped ZnO (AZO) thin film was deposited by using Facing Target Sputtering (FTS) system. This work examined the properties of AZO thin film as a function of the substrate temperature. The sputtering targets were 4 inch diameter disks of AZO (ZnO: Al2O3=98:2 wt.% ). The properties of electrical, structural and optical were investigated by 4-point probe, Hall effect measurement, x-ray diffractometer (XRD), field-emitting scanning electron microscopy (FE-SEM), and UV/VIS spectrometer. The lowest resistivity of films was 5.67ⅹ10-4 Ω.cm and the average optical transmittance of the films was above 85% in the visible range.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - IT융합대학 > 전기공학과 > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Kim, Kyung Hwan
- College of IT Convergence (Department of Electrical Engineering)