Effect of substrate temperature on the properties of AZO thin film deposited by using facing targets sputtering system
- Authors
- 정유섭; 김경환; 최명규
- Issue Date
- 2012
- Publisher
- 한국반도체디스플레이기술학회
- Keywords
- AZO; Substrate temperature; Facing targets sputtering
- Citation
- 반도체디스플레이기술학회지, v.11, no.1, pp.1 - 5
- Journal Title
- 반도체디스플레이기술학회지
- Volume
- 11
- Number
- 1
- Start Page
- 1
- End Page
- 5
- URI
- https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/17294
- ISSN
- 1738-2270
- Abstract
- Al doped ZnO (AZO) thin film was deposited by using Facing Target Sputtering (FTS) system. This work examined the properties of AZO thin film as a function of the substrate temperature. The sputtering targets were 4 inch diameter disks of AZO (ZnO: Al2O3=98:2 wt.% ). The properties of electrical, structural and optical were investigated by 4-point probe, Hall effect measurement, x-ray diffractometer (XRD), field-emitting scanning electron microscopy (FE-SEM), and UV/VIS spectrometer. The lowest resistivity of films was 5.67ⅹ10-4 Ω.cm and the average optical transmittance of the films was above 85% in the visible range.
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Collections - IT융합대학 > 전기공학과 > 1. Journal Articles
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