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대면적 스퍼터링 박막 제작을 위한 캐소드 설계 및 제작Design and Preparation of Cathode for Large Sputtering Thin Film
- Other Titles
- Design and Preparation of Cathode for Large Sputtering Thin Film
- Issue Date
- 2019
- Publisher
- 한국반도체디스플레이기술학회
- Keywords
- Cathode; Sputtering; Magnetic; Stimulation; ITO
- Citation
- 반도체디스플레이기술학회지, v.18, no.2, pp.53 - 57
- Journal Title
- 반도체디스플레이기술학회지
- Volume
- 18
- Number
- 2
- Start Page
- 53
- End Page
- 57
- ISSN
- 1738-2270
- Abstract
- In this study, we prepared sputtering cathode for large sputtering thin film in the facing targets sputtering(FTS) system. Before fabrication of cathode equipment, we investigated optimal magnetic flux in the sputtering cathode by using magnetic field stimulation(Comsol). According to the result of magnetic field stimulation, we manufactured the cathode. After we mounted laboratory-designed cathode on FTS system, the discharge properties were observed in vacuum condition. In addition, ITO films were deposited on glass substrate and their electrical and optical properties were investigated by various measurements (four-point probe, UV-VIS spectrometer, field emission scanning electron microscopy(FE-SEM), Hall-effect measurement).
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Collections - 의과대학 > 의학과 > 1. Journal Articles
- IT융합대학 > 전기공학과 > 1. Journal Articles
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Related Researcher
- Kim, Yu Jin
- College of Medicine (Department of Medicine)