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Accurate Design of Si-Compatible Tunneling Field-Effect Transistor with GeSn Source Junction by Ab Initio Calculation and Device Simulation

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dc.contributor.author조성재-
dc.date.available2020-04-24T06:37:56Z-
dc.date.issued2016-09-28-
dc.identifier.urihttps://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/28591-
dc.titleAccurate Design of Si-Compatible Tunneling Field-Effect Transistor with GeSn Source Junction by Ab Initio Calculation and Device Simulation-
dc.typeConference-
dc.citation.conferenceName2016 International Conference on Solid State Devices and Materials (SSDM)-
dc.citation.conferencePlace일본-
dc.citation.conferencePlaceTsukuba, Japan-
dc.citation.titleAbstract of 2016 SSDM-
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