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RF 스퍼터 공정압력의 변화에 따른 TiO2 박막의 특성The Characteristics of TiO2 thin films on Working pressure of RF Sputter
- Alternative Title
- The Characteristics of TiO2 thin films on Working pressure of RF Sputter
- Authors
- 최형욱
- Issue Date
- 20-Jun-2009
- Place
- 대한민국
창원켄벤션센터
- metadata.conference.dc.citation.conferenceName
- 2009년도 한국전기전자재료학회 하계학술대회
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Collections - IT융합대학 > 전기공학과 > 2. Conference Papers
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Related Researcher
- Choi, Hyung Wook
- College of IT Convergence (Department of Electrical Engineering)