Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
초박막 Si oxynitride의 스트레스에 의한 계면 열화 메커니즘Mechanism for stress-induced interface degradations in ultrathin Si oxynitrides
- Alternative Title
- Mechanism for stress-induced interface degradations in ultrathin Si oxynitrides
- Authors
- 이은철
- Issue Date
- 2-Nov-2007
- Place
- South Korea
충주대학교(충북 충주)
- metadata.conference.dc.citation.conferenceName
- 2007년도 한국전기전자재료학회
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 바이오나노대학 > 나노물리학과 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Lee, Eun Cheol
- BioNano Technology (Department of Physics)