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Uniformity Improvement of SiNx-Based Resistive Switching Memory by Suppressed Internal Overshoot Current

Authors
Kim, Min-HwiKim, SungjunBang, SuhyunKim, Tae-HyeonLee, Dong KeunCho, SeongjaePark, Byung-Gook
Issue Date
Jul-2018
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Keywords
RRAM; uniformity; internal overshoot current
Citation
IEEE TRANSACTIONS ON NANOTECHNOLOGY, v.17, no.4, pp.824 - 828
Journal Title
IEEE TRANSACTIONS ON NANOTECHNOLOGY
Volume
17
Number
4
Start Page
824
End Page
828
URI
https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/3629
DOI
10.1109/TNANO.2018.2842071
ISSN
1536-125X
Abstract
In this paper, we have investigated the effect of additional thin SiO2 layer on switching variability of SiNx-based resistive memory (RRAM). We found that excessive LRS state generated in set operation results in large reset current and abrupt reset operation. The abrupt reset operation leads to large distribution of HRS. To investigate the transient characteristics of switching procedure in detail, measurement environment was implemented with equivalent circuit, and measured current from equipment was separated into capacitive and resistive current of resistive memory cell. Consequently, we point the internal overshoot current occurring in set operation as the cause of the excessive leaky state leading to large resistance distributions. Finally, we confirm the effect of low resistance state value (R-LRS) and cell capacitance (C-DUT) on the internal overshoot current of RRAM.
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