Si(001)2x1 및 Si(001)2x1표면에서의 H, SiHx의 표면결합구조 및 화학적 반응성 연구:광화학적 Si-H 결합의 활성화를 통한 4족 반도체 저온원자층 에피텍시(LT-ALE)기법의 개발
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