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Electrical Characteristics of Tunneling Field-effect Transistors using Vertical Tunneling Operation Based on AlGaSb/InGaAs

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dc.contributor.authorKim, Bo Gyeong-
dc.contributor.authorKwon, Ra Hee-
dc.contributor.authorSeo, Jae Hwa-
dc.contributor.authorYoon, Young Jun-
dc.contributor.authorJang, Young In-
dc.contributor.authorCho, Min Su-
dc.contributor.authorLee, Jung-Hee-
dc.contributor.authorCho, Seongjae-
dc.contributor.authorKang, In Man-
dc.date.available2020-02-27T16:43:46Z-
dc.date.created2020-02-06-
dc.date.issued2017-11-
dc.identifier.issn1975-0102-
dc.identifier.urihttps://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/5555-
dc.description.abstractThis paper presents the electrical performances of novel AlGaSb/InGaAs heterojunction-based vertical-tunneling field-effect transistor (VTFET). The device performance was investigated in views of the on-state current (I-on), drain-induced barrier thinning (DIBT), and subthreshold swing (SS) as the gate length (L-G) was scaled down. The proposed TFET with a L-G of 5 nm operated with an I-on of 1.3 mA/mu m, a DIBT of 40 mV/V, and an SS of 23 mV/dec at a drain voltage (V-DS) of 0.23 V. The proposed TFET provided approximately 25 times lower DIBT and 12 times smaller SS compared with the conventional L-G of 5 nm TFET. The AlGaSb/InGaAs VTFET showed extremely high scalability and strong immunity against short-channel effects.-
dc.language영어-
dc.language.isoen-
dc.publisherSPRINGER SINGAPORE PTE LTD-
dc.relation.isPartOfJOURNAL OF ELECTRICAL ENGINEERING & TECHNOLOGY-
dc.subjectTFETS-
dc.subjectFETS-
dc.titleElectrical Characteristics of Tunneling Field-effect Transistors using Vertical Tunneling Operation Based on AlGaSb/InGaAs-
dc.typeArticle-
dc.type.rimsART-
dc.description.journalClass1-
dc.identifier.wosid000417378600026-
dc.identifier.doi10.5370/JEET.2017.12.6.2324-
dc.identifier.bibliographicCitationJOURNAL OF ELECTRICAL ENGINEERING & TECHNOLOGY, v.12, no.6, pp.2324 - 2332-
dc.identifier.kciidART002277744-
dc.identifier.scopusid2-s2.0-85032865005-
dc.citation.endPage2332-
dc.citation.startPage2324-
dc.citation.titleJOURNAL OF ELECTRICAL ENGINEERING & TECHNOLOGY-
dc.citation.volume12-
dc.citation.number6-
dc.contributor.affiliatedAuthorCho, Seongjae-
dc.type.docTypeArticle-
dc.subject.keywordAuthorTunneling field-effect transistor-
dc.subject.keywordAuthorHeterojunction-
dc.subject.keywordAuthorVertical tunneling-
dc.subject.keywordAuthorShort-channel Effect-
dc.subject.keywordAuthorDrain-induced barrier thinning-
dc.subject.keywordPlusTFETS-
dc.subject.keywordPlusFETS-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
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