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ITO/Ag Multilayer Films Fabricated by Low-Damaging Facing-Target Sputtering
- Issue Date
- Sep-2017
- Publisher
- AMER SCIENTIFIC PUBLISHERS
- Keywords
- ITO; Ag; Multilayer; Low-Damaging; DFTS
- Citation
- SCIENCE OF ADVANCED MATERIALS, v.9, no.9, pp.1551 - 1554
- Journal Title
- SCIENCE OF ADVANCED MATERIALS
- Volume
- 9
- Number
- 9
- Start Page
- 1551
- End Page
- 1554
- ISSN
- 1947-2935
- Abstract
- Bendable and transparent multilayer ITO/Ag films are prepared using dual-facing target sputtering at room temperature. Precise control of the film thickness is successfully achieved in ultrathin Ag films, yielding high conductivity and transparency in the visible range. Ag-stacked ITO films exhibit higher transparency than Ag-only films. This result may be attributed to a reduction in the surface scattering of the Ag film due to the low emissivity of the ITO film. Optimized ITO (50 nm)/Ag (12 nm) films have a sheet resistance of 8 ohm/sq. and a transmittance of over 80% in the visible range. Additionally, the ITO/Ag films exhibit high mechanical durability and low electrical degradation (below 10%) compared to pristine films.
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Related Researcher
- Kim, Kyung Hwan
- College of IT Convergence (Department of Electrical Engineering)