투명전도성 박막의 활용을 위한 스퍼터링 증착 기술과 전망Sputtering Technology and Prospect for Transparent Conductive Thin Film
- Other Titles
- Sputtering Technology and Prospect for Transparent Conductive Thin Film
- Authors
- 김상모; 김경환
- Issue Date
- Mar-2023
- Publisher
- 한국전기전자재료학회
- Keywords
- Sputtering; TCO; Film; Deposition
- Citation
- 전기전자재료학회논문지, v.36, no.2, pp.109 - 124
- Journal Title
- 전기전자재료학회논문지
- Volume
- 36
- Number
- 2
- Start Page
- 109
- End Page
- 124
- URI
- https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/87204
- ISSN
- 1226-7945
- Abstract
- For decades, sputtering as a physical vapor deposition (PVD) method has been a widely used technique for film coating processes. The sputtering enables oxides, metals, alloys, nitrides, etc to be deposited on a wide variety of substrates from silicon wafers to polymer substrates. Meanwhile, transparent conductive oxides (TCOs) have played important roles as electrodes in electrical applications such as displays, sensors, solar cells, and thin-film transistors. TCO films fabricated through a sputtering process have a higher quality leading to an improved device performance than other films prepared with other methods. In this review, we discuss the mechanism of sputtering deposition and detail the TCO materials. Related technologies (processing conditions, materials, and applications) are introduced for electrical applications.
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Collections - IT융합대학 > 전기공학과 > 1. Journal Articles
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