Rapid photonic curing effects of xenon flash lamp on ITO-Ag-ITO multilayer electrodes for high throughput transparent electronics
- Authors
- Zhao, Zhenqian; Rose, Alex; Kwon, Sang Jik; Jeon, Yongmin; Cho, Eou-Sik
- Issue Date
- Jan-2023
- Publisher
- NATURE PORTFOLIO
- Citation
- Scientific Reports, v.13, no.1
- Journal Title
- Scientific Reports
- Volume
- 13
- Number
- 1
- URI
- https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/88202
- DOI
- 10.1038/s41598-023-27942-4
- ISSN
- 2045-2322
- Abstract
- High-throughput transparent and flexible electronics are essential technologies for next-generation displays, semiconductors, and wearable bio-medical applications. However, to manufacture a high-quality transparent and flexible electrode, conventional annealing processes generally require 5 min or more at a high temperature condition of 300 °C or higher. This high thermal budget condition is not only difficult to apply to general polymer-based flexible substrates, but also results in low-throughput. Here, we report a high-quality transparent electrode produced with an extremely low thermal budget using Xe-flash lamp rapid photonic curing. Photonic curing is an extremely short time (~ μs) process, making it possible to induce an annealing effect of over 800 °C. The photonic curing effect was optimized by selecting the appropriate power density, the irradiation energy of the Xe-flash lamp, and Ag layer thickness. Rapid photonic curing produced an ITO–Ag–ITO electrode with a low sheet resistance of 6.5 ohm/sq, with a high luminous transmittance of 92.34%. The low thermal budget characteristics of the rapid photonic curing technology make it suitable for high-quality transparent electronics and high-throughput processes such as roll-to-roll.
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