Annealing and Doping Effects on Transition Metal Dichalcogenides-Based Devices: A Reviewopen access
- Authors
- Ko, Raksan; Lee, Dong Hyun; Yoo, Hocheon
- Issue Date
- Aug-2023
- Publisher
- MDPI
- Keywords
- two-dimensional transition metal dichalcogenides; field effect transistor; annealing process; chemical doping
- Citation
- COATINGS, v.13, no.8
- Journal Title
- COATINGS
- Volume
- 13
- Number
- 8
- URI
- https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/89090
- DOI
- 10.3390/coatings13081364
- ISSN
- 2079-6412
- Abstract
- Transition metal dichalcogenides (TMDC) have been considered promising electronic materials in recent years. Annealing and chemical doping are two core processes used in manufacturing electronic devices to modify properties and improve device performance, where annealing enhances crystal quality, reduces defects, and enhances carrier mobility, while chemical doping modifies conductivity and introduces new energy levels within the bandgap. In this study, we investigate the annealing effects of various types of dopants, time, and ambient conditions on the diverse material properties of TMDCs, including crystal structure quality, defect density, carrier mobility, electronic properties, and energy levels within the bandgap.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - IT융합대학 > 전자공학과 > 1. Journal Articles
![qrcode](https://api.qrserver.com/v1/create-qr-code/?size=55x55&data=https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/89090)
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.