Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

Effect of Oxygen-Evaporation-Preventative Post-Annealing Gas Conditions on NiO Thin Filmsopen access

Authors
Kim, HyungminKim, KyunghwanHong, Jeongsoo
Issue Date
Nov-2023
Publisher
MDPI
Keywords
nickel oxide; radio frequency sputtering; rapid thermal annealing
Citation
COATINGS, v.13, no.11
Journal Title
COATINGS
Volume
13
Number
11
URI
https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/89656
DOI
10.3390/coatings13111954
ISSN
2079-6412
2079-6412
Abstract
In this study, NiO films were fabricated through radio frequency sputtering with various oxygen flow rates and processed via rapid thermal annealing under Ar, O2, and N2 atmospheres. The electrical, optical, and crystallographic properties of the NiO films were influenced by their oxygen content in each film. As the oxygen content, carrier concentration, and resistivity increased, transmittance and mobility decreased. The carrier mobility of the NiO film in the p-type layer of the photodetector requires improvement. Rapid thermal annealing (RTA) has been widely used to improve the crystallinity and mobility of films. However, the reduction in oxygen content during RTA causes a decrease in the carrier concentration and transmittance of NiO films. Regarding the aim of preventing a reduction in oxygen content in the NiO films due to the RTA process, an O2 atmosphere (compared with Ar and N2 atmospheres) was identified as the optimal condition for mobility (3.42 cm2/V center dot s) and transmittance (50%).
Files in This Item
There are no files associated with this item.
Appears in
Collections
ETC > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Hong, Jeong Soo photo

Hong, Jeong Soo
College of IT Convergence (Department of Electrical Engineering)
Read more

Altmetrics

Total Views & Downloads

BROWSE