ScholarWorks@Hanyang University

Browsing by 정경민Author

All A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

Showing results 1 to 1 of 1

SCIESCOPUS
Highly Robust Atomic Layer Deposition-Indium Gallium Zinc Oxide Thin-Film Transistors with Hybrid Gate Insulator Fabricated via Two-Step Atomic Layer Process for High-Density Integrated All-Oxide Vertical Complementary Metal-Oxide-Semiconductor ApplicationsGo to Linkopen access

김동규; Choi, Su-Hwan; 이원범; 정경민; Koh, Jihyun; Lee, Seunghee; Kuh, Bongjin; Park, Jin-Seong

ArticleIssue Date2024CitationSmall Structures, v.5, no.2, pp 1 - 11PublisherJohn Wiley and Sons Inc
1
CONTACT US

RSS_1.0 RSS_2.0 ATOM_1.0

222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1366

COPYRIGHT © 2024 HANYANG UNIVERSITY.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.

BROWSE

한국어