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Plasma-enhanced atomic layer deposited HfO2 films using a novel heteroleptic cyclopentadienyl-based Hf precursorGo to Link

Baek, Ji-hoon; Choi, Wan-ho; Kim, Hohoon; Cheon, Seonghak; Byun, Younghun; Jeon, Woojin; Park, Jin-Seong

ArticleIssue Date2021CitationCERAMICS INTERNATIONAL, v.47, no.20, pp.29030 - 29035PublisherELSEVIER SCI LTD
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