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Performance of organic field effect transistors with high-k gate oxide after application of consecutive bias stressGo to Link

Lee, Sunwoo; Choi, Changhwan; Lee, Kilbock; Cho, Joong Hwee; Ko, Ki-Young; Ahn, Jinho

ArticleIssue Date2012CitationThin Solid Films, v.521, pp 30 - 33PublisherElsevier Sequoia
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