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A Study on the Electrical Properties of Atomic Layer Deposition Grown InOx on Flexible Substrates with Respect to N2O Plasma Treatment and the Associated Thin-Film Transistor Behavior under Repetitive Mechanical StressGo to Link

Sheng, Jiazhen; Park, Jozeph; Choi, Dong-won; Lim, Junhyung; Park, Jin-Seong

ArticleIssue Date2016CitationACS Applied Materials & Interfaces, v.8, no.45, pp 31136 - 31143PublisherAmerican Chemical Society
SCISCIESCOPUS
A Study on the Growth Behavior and Stability of Molecular Layer Deposited Alucone Films Using Diethylene Glycol and Trimethyl Aluminum Precursors, and the Enhancement of Diffusion Barrier Properties by Atomic Layer Deposited Al₂O₃CappingGo to Link

Choi, Dong-won; Yoo, Mi; Lee, Hyuck Mo; Park, Jozeph; Kim, Hyun You; Park, Jin-Seong

ArticleIssue Date2016CitationACS Applied Materials & Interfaces, v.8, no.19, pp 12263 - 12271PublisherAmerican Chemical Society
SCISCIESCOPUS
Atomic layer deposition of highly conductive indium oxide using a liquid precursor and water oxidantGo to Link

Maeng, W. J.; Choi, Dong-won; Park, Jozeph; Park, Jin-Seong

ArticleIssue Date2015CitationCeramics International, v.41, no.9, pp 10782 - 10787PublisherElsevier
SCISCIESCOPUS
Highly Conducting, Transparent, and Flexible Indium Oxide Thin Film Prepared by Atomic Layer Deposition Using a New Liquid Precursor Et2InN(SiMe3)(2)Go to Link

Maeng, Wan Joo; Choi, Dong-won; Chung, Kwun-Bum; Koh, Wonyong; Kim, Gi-Yeop; Choi, Si-Young; Park, Jin-Seong

ArticleIssue Date2014CitationACS Applied Materials & Interfaces, v.6, no.20, pp 17481 - 17488PublisherAmerican Chemical Society
SCISCIESCOPUS
Highly conductive SnO2 thin films deposited by atomic layer deposition using tetrakis-dimethyl-amine-tin precursor and ozone reactantGo to Link

Choi, Dong-won; Park, Jin-Seong

ArticleIssue Date2014CitationSurface and Coatings Technology, v.259, pp 238 - 243PublisherElsevier BV
SCISCIESCOPUS
Low temperature Ga2O3 atomic layer deposition using gallium tri-isopropoxide and waterGo to Link

Choi, Dong-won; Chung, Kwun-Bum; Park, Jin-Seong

ArticleIssue Date2013CitationThin Solid Films, v.546, pp 31 - 34PublisherElsevier Sequoia
SCISCIESCOPUS
Rapid vapor deposition SiO2 thin film deposited at a low temperature using tris(tert-pentoxy)silanol and trimethyl-aluminumGo to Link

Choi, Dong-won; Chung, Kwun-Bum; Park, Jin-Seong

ArticleIssue Date2013CitationMaterials Chemistry and Physics, v.142, no.2-3, pp 614 - 618PublisherElsevier BV
SCISCIESCOPUS
The conducting tin oxide thin films deposited via atomic layer deposition using Tetrakis-dimethylamino tin and peroxide for transparent flexible electronicsGo to Link

Choi, Dong-won; Maeng, W. J.; Park, Jin-Seong

ArticleIssue Date2014CitationApplied Surface Science, v.313, pp 585 - 590PublisherElsevier BV
SCISCIESCOPUS
The effect of the annealing temperature on the transition from conductor to semiconductor behavior in zinc tin oxide deposited atomic layer depositionGo to Link

Du Ahn, Byung; Choi, Dong-won; Choi, Changhwan; Park, Jin-Seong

ArticleIssue Date2014CitationApplied Physics Letters, v.105, no.9, pp 1 - 5PublisherAmerican Institute of Physics
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