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SCIESCOPUS
Control of axial direction electron temperature distribution by gradient DC magnetic field in inductively coupled plasmaGo to Link

Jiang, Yi-Lang; He, You; Seo, Beom-Jun; Lee, Myoung-Jae; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationPlasma Sources Science and Technology, v.34, no.3, pp 1 - 12PublisherInstitute of Physics Publishing
SCIESCOPUS
Control of photoresist etch rate via a gradient magnetic field in biased inductively coupled plasmaGo to Link

Jiang, Yi-Lang; Jeong, Yeong Jae; Kim, Jae-Hwi; Kim, Min-Seok; Lee, Myoung-Jae; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationPlasma Sources Science and Technology, v.34, no.7, pp 1 - 13PublisherInstitute of Physics Publishing
SCIESCOPUS
Effect of a DC gradient magnetic field on electron density in a weakly magnetized inductively coupled plasmaGo to Link

He, You; Jiang, Yi-Lang; Lee, Myoung-Jae; Kim, Min-Seok; Seo, Beom-Jun; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2024CitationJournal of Vacuum Science and Technology A, v.42, no.6, pp 1 - 12PublisherAmerican Institute of Physics
SCIESCOPUS
Electron temperature and ion density distribution on a vertical section in a weakly magnetized inductively coupled plasmaGo to Link

He, You; Jiang, Yi-Lang; Lee, Myoung-Jae; Seo, Beom-Jun; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2024CitationJournal of Vacuum Science and Technology A, v.42, no.6, pp 1 - 13PublisherAmerican Institute of Physics
SCIE
Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etchingGo to Link

Kim, Ju-Ho; Jiang, Yi-Lang; Jeong, Yeong Jae; Kim, Jae-Hwi; Chung, Chin-Wook

ArticleIssue Date2026CitationPLASMA SOURCES SCIENCE & TECHNOLOGY, v.35, no.3, pp 1 - 14PublisherIOP Publishing Ltd
SCIESCOPUS
The effect of two ECR zones on dual frequency inductively coupled plasma using a gradient DC magnetic fieldGo to Linkopen access

Jiang, Yi-Lang; He, You; Kim, Min-Seok; Lee, Myoung-Jae; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationJournal of Applied Physics, v.137, no.21, pp 1 - 10PublisherAmerican Institute of Physics
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