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SCIESCOPUS
Effect of alkaline agent in colloidal silica slurry for polycrystalline silicon chemical mechanical polishingGo to Link

Lee, Myung Yoon; Kang, Hyun Goo; Kanemoto, Manabu; Paik, Ungyu; Park, Jea Gun

ArticleIssue Date2007CitationJapanese Journal of Applied Physics, v.46, no.8A, pp 5089 - 5094PublisherIOP Publishing Ltd
SCIESCOPUS
Effects of calcination and milling process conditions for ceria slurry on shallow-trench-isolation chemical-mechanical polishing performanceGo to Link

Kim, Jun-Seok; Kang, Hyun-Goo; Kanemoto, Manabu; Paik, Ungyu; Park, Jea-Gun

ArticleIssue Date2007CitationJapanese Journal of Applied Physics, v.46, no.12, pp 7671 - 7677PublisherIOP Publishing Ltd
SCIESCOPUSKCI
Effects of the size and the concentration of the abrasive in a colloidal silica (SiO2) slurry with added TMAH on removal selectivity of polysilicon and oxide films in polysilicon chemical mechanical polishingGo to Link

Park, Kyung Woong; Kang, Hyun Goo; Kanemoto, Manabu; Park, Jea Gun; Paik, Ungyu

ArticleIssue Date2007CitationJournal of the Korean Physical Society, v.51, no.1, pp 214 - 223Publisher한국물리학회
SCIESCOPUS
Nanotopography impact of surfactant concentration and molecular weight of nano-ceria slurry on remaining oxide thickness variation after shallow trench isolation chemical mechanical polishingGo to Link

Park, Jin Hyung; Kanemoto, Manabu; Paik, Ungyu; Park, Jea Gun

ArticleIssue Date2007CitationJapanese Journal of Applied Physics, v.46, no.8A, pp 5076 - 5079PublisherIOP Publishing Ltd
SCIESCOPUSKCI
Selectivity enhancement in the removal of SiO2 and Si3N4 films with addition of triethanolamine in a ceria slurry during shallow trench isolation chemical mechanical polishingGo to Link

Park, Keum-Seok; Kang, Hyun-Goo; Kanemoto, Manabu; Park, Jea-Gun; Paik, Ungyu

ArticleIssue Date2008CitationJournal of the Korean Physical Society, v.53, no.3, pp 1337 - 1342Publisher한국물리학회
SCIESCOPUS
The impact of wafer nanotopography on threshold voltage variation in NAND flash memory cells fabricated with poly-silicon chemical mechanical polishingGo to Link

Park, Jea-Gun; Park, Jin-Hyung; Kim, Seong-Je; Kanemoto, Manabu; Lee, Gon-Sub

ArticleIssue Date2008CitationSemiconductor Science and Technology, v.23, no.12, pp 1 - 8PublisherInstitute of Physics Publishing
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