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Improving etchability and imaging performance of EUV mask absorber materials via ion implantationGo to Link

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Kim, Bom-Sok; Kim, Myung-Jin; Lee, Taeho; Ahn, Jinho

ArticleIssue Date2026CitationApplied Physics A: Materials Science and Processing, v.132, no.4, pp 1 - 8PublisherSpringer Science and Business Media Deutschland GmbH
SCIESCOPUS
Improving etchability and imaging performance of EUV mask absorber materials via ion implantation (Vol 132, 245, 2026)Go to Link

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Kim, Bom-Sok; Kim, Myung-Jin; Lee, Taeho; Ahn, Jinho

ArticleIssue Date2026CitationAPPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.132, no.5, pp 1 - 1PublisherSPRINGER HEIDELBERG
SCOPUS
Improving Etchability of Challenging Materials through the Ion Implantation Process

Kim, Yunsoo; Jeong, Dongmin; Lee, Seungho; Kim, Myung-Jin; Kim, Bom-Sok; Lee, Taeho; Ahn, Jinho

ArticleIssue Date2024CitationProceedings of SPIE - The International Society for Optical Engineering, v.13215, pp 1 - 6PublisherSPIE
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