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Atomic layer deposition for rutile structure TiO2 thin films using a SnO2 seed layer and low temperature heat treatment Go to Link

Kim, Byunguk; Choi, Yeonsik; Lee, Dahyun; Cheon, Seonghak; Byun, Younghun; Jeon, Hyeongtag

ArticleIssue Date2022CitationNANOTECHNOLOGY, v.33, no.11, pp 1 - 12PublisherIOP PUBLISHING LTD

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Atomic layer deposition of MoNx thin films using a newly synthesized liquid Mo precursor Go to Link

Kim, Byunguk; Lee, Sangmin; Kang, Taesung; Kim, Sunghoon; Koo, Sangman; Jeon, Hyeongtag

ArticleIssue Date2022CitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.40, no.6, pp.1 - 10PublisherA V S AMER INST PHYSICS

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Controlling tin oxysulfide thin film compositions and electronic band structures using atomic layer deposition and vacuum annealing process Go to Link

Choi, Yeonsik; Kim, Byunguk; 이도욱; Jeon, Hyeongtag

ArticleIssue Date2023CitationTHIN SOLID FILMS, v.769, pp 1 - 8PublisherELSEVIER SCIENCE SA

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Corrigendum to “Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)” [J. Alloy. Compd. 857 (2021) 157931] (Journal of Alloys and Compounds (2021) 857, (S092583882034295X), (10.1016/j.jallcom.2020.157931))Go to Link open access

Kim, Byunguk; Lee, Namgue; Park, Suhyeon; Park, Taehun; Song, Jaiwon; Han, Seungwook; Park, Hyunwoo; Lee, Dahyun; Kim, Hohoon; Jeon, Hyeongtag

ArticleIssue Date2023CitationJournal of Alloys and Compounds, v.931, pp.1 - 2PublisherElsevier Ltd

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Radical-Induced Effect on PEALD SiO2 Films by Applying Positive DC Bias Go to Link

Park, Suhyeon; Park, Taehun; Choi, Yeongtae; 정찬원; Kim, Byunguk; Jeon, Hyeongtag

ArticleIssue Date2022CitationECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, v.11, no.2, pp 1 - 7PublisherELECTROCHEMICAL SOC INC

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Remote plasma enhanced atomic layer deposition of titanium nitride film using metal organic precursor (C12H23N3Ti) and N-2 plasma Go to Link

Kim, Byunguk; Lee, Namgue; Lee, Junghoon; Park, Taehun; Park, Hyunwoo; Kim, Youngjoon; Jin, Changhyun; Lee, Dahyun; Kim, Hohoon; Jeon, Hyeongtag

ArticleIssue Date2021CitationAPPLIED SURFACE SCIENCE, v.541, pp.1 - 6PublisherELSEVIER

SCIESCOPUS

The effect of an annealing process on atomic layer deposited TiO2 thin films Go to Link

Kim, Byunguk; Kang, Taeseong; Lee, Gucheol; Jeon, Hyeongtag

ArticleIssue Date2022CitationNanotechnology, v.33, no.4, pp 1 - 9PublisherInstitute of Physics Publishing

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Tuning properties of SnO2/Au/SnO(2)multilayer with variable Au thicknesses as transparent conductive oxides Go to Link

Park, Hyunwoo; Choi, Hyeongsu; Lee, Namgue; Jung, Chanwon; Choi, Yeonsik; Park, Suhyeon; Kim, Byunguk; Yuk, Hyunwoo; Choi, Yeongtae; Kim, Keunsik, et al.

ArticleIssue Date2020CitationJapanese Journal of Applied Physics, v.59, no.10, pp 1 - 6PublisherIOP Publishing Ltd

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Browsing by Kim, ByungukAuthor

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