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Corrigendum to “Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)” [J. Alloy. Compd. 857 (2021) 157931] (Journal of Alloys and Compounds (2021) 857, (S092583882034295X), (10.1016/j.jallcom.2020.157931))Go to Linkopen access

Kim, Byunguk; Lee, Namgue; Park, Suhyeon; Park, Taehun; Song, Jaiwon; Han, Seungwook; Park, Hyunwoo; Lee, Dahyun; Kim, Hohoon; Jeon, Hyeongtag

ArticleIssue Date2023CitationJournal of Alloys and Compounds, v.931, pp.1 - 2PublisherElsevier Ltd
SCIESCOPUS
Plasma-enhanced atomic layer deposited HfO2 films using a novel heteroleptic cyclopentadienyl-based Hf precursorGo to Link

Baek, Ji-hoon; Choi, Wan-ho; Kim, Hohoon; Cheon, Seonghak; Byun, Younghun; Jeon, Woojin; Park, Jin-Seong

ArticleIssue Date2021CitationCERAMICS INTERNATIONAL, v.47, no.20, pp.29030 - 29035PublisherELSEVIER SCI LTD
SCIESCOPUS
Remote plasma enhanced atomic layer deposition of titanium nitride film using metal organic precursor (C12H23N3Ti) and N-2 plasmaGo to Link

Kim, Byunguk; Lee, Namgue; Lee, Junghoon; Park, Taehun; Park, Hyunwoo; Kim, Youngjoon; Jin, Changhyun; Lee, Dahyun; Kim, Hohoon; Jeon, Hyeongtag

ArticleIssue Date2021CitationAPPLIED SURFACE SCIENCE, v.541, pp.1 - 6PublisherELSEVIER
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