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Etching characteristics of photoresist and low-k dielectrics by Ar/O-2 ferrite-core inductively coupled plasmas Go to Link

Kim, Hyoun Woo; Lee, Jong Woo; Hwang, Woon Suk; Beom, Hoan O.; Lee, Seung Gol; Park, Se-Geun; Kim, Joohee; Chung, Duck Jin; Chang, Sung Pil; Joo, Young-Chang, et al.

ArticleIssue Date2008CitationMicroelectronic Engineering, v.85, no.2, pp 300 - 303PublisherElsevier BV

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Heuristic algorithms for re-entrant hybrid flow shop scheduling with unrelated parallel machines Go to Link

Kim, Hyoun Woo; Lee, Dong Ho

ArticleIssue Date2009CitationProceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture, v.223, no.4, pp 433 - 442PublisherProfessional Engineering Publishing Ltd.

SCIESCOPUS

Photoresist ashing technology using N-2/O-2 ferrite-core ICP in the dual damascene process Go to Link

Kim, Hyoun Woo; Myung, Ju Hyun; Lee, Jong Woo; Kim, Hyung-Sun; Kim, Keeho; Jang, Jeong-Yeol; Yoon, Tae-Ho; Kim, Sung Kyeong; Choi, Dae-Kyu; Chung, Chin-Wook, et al.

ArticleIssue Date2006CitationJournal of Materials Science, v.41, no.15, pp 5040 - 5042PublisherKluwer Academic Publishers

SCOPUS

SnO2 nanostructures synthesized on Co substrates Go to Link

Kim, Hyoun Woo; Shim, Seung Hyun; Hwang, Hae Jin; Shim, Jae Hyun; Cho, Nam Hee; Park, Mi Kyoung; Lee, Hyuck Mo; Ahn, Byung Tae; Jeon, Hyeongtag; Park, Jong Wan, et al.

ArticleIssue Date2007CitationSolid State Phenomena, v.124-126, no.PART 2, pp 1289 - 1292PublisherScitec Publications Ltd.

SCIESCOPUS

Study of ashing for low-k dielectrics using the N-2/O-2 ferrite-core inductively coupled plasmas Go to Link

Kim, Hyoun Woo; Myung, Ju Hyun; Kim, Nam Ho; Lee, Han Sup; Park, Se-Geun; Lee, Jae Gab; Chung, Chin Woo; Park, Wan Jae; Kang, Chang-Jin; Yoo, Chung-Gon, et al.

ArticleIssue Date2006CitationThin Solid Films, v.506, pp 222 - 224PublisherElsevier Sequoia

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Browsing by Kim, Hyoun WooAuthor

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