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Study of ashing for low-k dielectrics using the N-2/O-2 ferrite-core inductively coupled plasmasGo to Link

Kim, Hyoun Woo; Myung, Ju Hyun; Kim, Nam Ho; Lee, Han Sup; Park, Se-Geun; Lee, Jae Gab; Chung, Chin Woo; Park, Wan Jae; Kang, Chang-Jin; Yoo, Chung-Gon, et al.

ArticleIssue Date2006CitationThin Solid Films, v.506, pp 222 - 224PublisherElsevier Sequoia
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