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Fabrication of trench nanostructures for extreme ultraviolet lithography masks by atomic force microscope lithographyGo to Link

Kwon, Gwangmin; Ko, Kyeongkeun; Lee, Haiwon; Lim, Woongsun; Yeom, Geun Young; Lee, Sunwoo; Ahn, Jinho

ArticleIssue Date2011CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.29, no.1, pp 1 - 6PublisherAmerican Institute of Physics
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