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Consensus in Psychiatric Emergencies Using the Delphi TechniqueGo to Link

Lee, Hyerin; Noh, Jin-Won; Choi, Joonho; Cho, Heeyoon; Kim, Kyoung-Beom; Seo, Sungsook; Yun, Somi; Hong, Eun Hee

ArticleIssue Date2024CitationPsychiatry Investigation, v.21, no.11, pp 1260 - 1267Publisher대한신경정신의학회
SCISCIESCOPUS
Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin FilmsGo to Link

Kim, Hyungchul; Woo, Sanghyun; Lee, Jaesang; Kim, Yongchan; Lee, Hyerin; Choi, Ik-Jin; Kim, Young-Do; Chung, Chin-Wook; Jeon, Hyeongtag

ArticleIssue Date2011CitationJournal of the Electrochemical Society, v.158, no.1, pp H21 - H24PublisherElectrochemical Society, Inc.
SCISCIESCOPUSKCI
Effects of a SiO2 buffer layer on the flatband voltage shift of La2O3 gate dielectric grown by using remote plasma atomic layer depositionGo to Link

Lee, Hyerin; Kim, Hyungchul; Lee, Jaesang; Jeon, Hyeongtag

ArticleIssue Date2012CitationJournal of the Korean Physical Society, v.61, no.7, pp 1051 - 1055Publisher한국물리학회
SCISCIESCOPUS
Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer depositionGo to Link

Kim, Yongchan; Woo, Sanghyun; Kim, Hyungchul; Lee, Jaesang; Kim, Honggyu; Lee, Hyerin; Jeona, Hyeongtag

ArticleIssue Date2010CitationJournal of Materials Research, v.25, no.10, pp 1898 - 1903PublisherMaterials Research Society
SCOPUS
Low resistive and uniform CoSi 2 formation with Ti capping layerGo to Link

Lee, Jaesang; Kim, Hyungchul; Woo, Sanghyun; Lee, Hyerin; Jeon, Hyeong tag

ArticleIssue Date2011CitationAIP Conference Proceedings, v.1399, pp 187 - 188PublisherAmerican Institute of Physics
SCISCIESCOPUS
The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALDGo to Link

Kim, Hyungchul; Woo, Sanghyun; Lee, Jaesang; Kim, Honggyu; Kim, Yongchan; Lee, Hyerin; Jeon, Hyeongtag

ArticleIssue Date2010CitationJournal of the Electrochemical Society, v.157, no.4, pp H479 - H482PublisherElectrochemical Society, Inc.
SCISCIESCOPUS
The effects of RF power on the interfacial property between Al2O3 and Si3N4 and on the memory property in a MANOS structureGo to Link

Kim, Hyungchul; Woo, Sanghyun; Lee, Jaesang; Lee, Hyerin; Jeon, Hyeongtag

ArticleIssue Date2010CitationJournal of Physics D: Applied Physics, v.43, no.50, pp 1 - 6PublisherIOP Publishing Ltd.
SCIESSCISCOPUSKCI
Validity of the Korean Version of the Brief Irritability Test in Psychiatric PatientsGo to Link

Lee, Hyerin; Park, Yongchon; Kim, Deaho; Choi, Joonho; Park, Seon-Cheol; Kim, Ilbin; Kim, Eunkyung

ArticleIssue Date2024CitationPsychiatry Investigation, v.21, no.4, pp 396 - 402Publisher대한신경정신의학회
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