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Showing results 1 to 12 of 12

SCIESCOPUS
A method for measuring electron temperature and ion density with immunity to RF fluctuation and ion currentGo to Link

Eo, Hyundong; Kim, Kyung-Hyun; Lee, Moo-Young; Kim, Ju Ho; Chung, Chin-Wook

ArticleIssue Date2023CitationPHYSICS OF PLASMAS, v.30, no.2, pp.1 - 8PublisherAIP Publishing
SCIESCOPUS
A method for measuring plasma parameters and dielectric film thickness by analyzing transient voltages for deposition plasma processing monitoringGo to Link

Lee, Moo-Young; Jung, Jiwon; Kim, Tae-Woo; Kim, Kyung-Hyun; Chung, Chin-Wook

ArticleIssue Date2020CitationPlasma Sources Science and Technology, v.29, no.7, pp 1 - 9PublisherInstitute of Physics Publishing
SCIESCOPUS
A wafer-like apparatus for two-dimensional measurement of plasma parameters and temperature distribution in low-temperature plasmasGo to Link

Lim, Yeong-Min; Eo, Hyundong; Kim, Kyung-Hyun; Lee, Moo-Young; Chung, Chin Wook

ArticleIssue Date2021CitationReview of Scientific Instruments, v.92, no.5, pp.1 - 11PublisherAmerican Institute of Physics Inc.
SCIESCOPUS
Control of electron and ion density profiles via virtual ground position control in an inductively coupled plasmaGo to Link

Kim, Tae-Woo; Kim, Ju-ho; Lee, Moo-Young; Chung, Chin-Wook

ArticleIssue Date2020CitationPHYSICS OF PLASMAS, v.27, no.7, pp.1 - 9PublisherAMER INST PHYSICS
SCIESCOPUS
Effects of RF bias frequency and power on the plasma parameters and ash rate in a remote plasma sourceGo to Link

Zhang, Aixian; Lee, Moo-Young; Lee, Ho-Won; Moon, Ho-Jun; Chung, Chin-Wook

ArticleIssue Date2021CitationPLASMA SOURCES SCIENCE & TECHNOLOGY, v.30, no.2, pp.1 - 9PublisherIOP PUBLISHING LTD
SCIESCOPUS
Experimental investigation on optimal plasma generation in inductively coupled plasmaGo to Link

Hong, Young-Hun; Kim, Ju-Ho; Kim, Tae-Woo; Lee, Ho-Won; Lee, Moo-Young; Chung, Chin-Wook

ArticleIssue Date2021CitationPhysics of Plasmas, v.28, no.5, pp.1 - 7PublisherAmerican Institute of Physics Inc.
SCIESCOPUS
Experimental observation of the effect of electron attachment and detachment reactions on the electron energy distribution in an inductive oxygen dischargeGo to Link

Jung, Jiwon; Lee, Moo-Young; Kim, Kyung-Hyun; Chung, Chin-Wook

ArticleIssue Date2020CitationPHYSICS OF PLASMAS, v.27, no.10, pp.1 - 8PublisherAMER INST PHYSICS
SCIESCOPUS
Improved numerical AC superposition method for electron energy distribution functionsGo to Link

Kang, Hyun-Ju; Kim, Dong-Hwan; Lee, Moo-Young; Chung, Chin-Wook

ArticleIssue Date2017CitationPhysics of Plasmas, v.24, no.11PublisherAmerican Institute of Physics
SCIESCOPUS
Improvement of the floating probe method for ion density and electron temperature measurement without compensation due to voltage reduction across the sheathGo to Link

Lee, Moo-Young; Seo, Jong-In; Eo, Hyundong; Kim, Tae-Woo; Jung, Jiwon; Lim, Yeong-Min; Chung, Chin-Wook

ArticleIssue Date2021CitationPLASMA SOURCES SCIENCE & TECHNOLOGY, v.30, no.6, pp.1 - 8PublisherIOP PUBLISHING LTD
SCIESCOPUS
Local electron and ion density control using passive resonant coils in inductively coupled plasmaGo to Link

Kim, Tae-Woo; Lee, Moo-Young; Hong, Young-Hun; Lee, Moo-Hyun; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2021CitationPLASMA SOURCES SCIENCE & TECHNOLOGY, v.30, no.2, pp.1 - 9PublisherIOP PUBLISHING LTD
SCIESCOPUS
The opposite pressure dependence of electron temperature with respect to O-2/Ar mixing ratio in an inductively coupled plasmaGo to Link

Lee, Moo-Young; Jung, Jiwon; Kim, Tae-Woo; Kim, Kyung-Hyun; Kwon, Deuk-Chul; Chung, Chin-Wook

ArticleIssue Date2020CitationPHYSICS OF PLASMAS, v.27, no.11, pp.1 - 9PublisherAMER INST PHYSICS
SCIESCOPUS
Transient voltage analysis on a series capacitor of the floating probe for plasma diagnosticsGo to Link

Lee, Moo-Young; Kim, Kyung-Hyun; Chung, Chin-Wook

ArticleIssue Date2018CitationPLASMA SOURCES SCIENCE & TECHNOLOGY, v.27, no.7PublisherIOP PUBLISHING LTD
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