The opposite pressure dependence of electron temperature with respect to O-2/Ar mixing ratio in an inductively coupled plasma

Abstract

o observe the evolution of electron temperature and electron density when varying gas mixing ratio and pressure, the measurement of electron energy probability functions (EEPFs) and a kinetic simulation are performed in an O2/Ar inductively coupled plasma. When O2 gas is diluted to pure Ar plasma, the electron density significantly drops regardless of gas pressures and the reduction of electron density increases with gas pressure. This sudden drop of plasma density is due to various inelastic collisions between electrons and O2 molecules. However, the trend of electron temperature variation with respect to the ratio of O2 and Ar is opposite at low and high pressures. At low pressure (5 mTorr), the electron temperature decreases with the addition of O2 up to a 10% O2 ratio. With further addition of O2, the electron temperature increases gradually. On the other hand, at high pressures (25 and 80 mTorr), the electron temperature rises with addition of O2 up to a 10%-20% O2 ratio and then falls gradually with further addition of O2. Simulations show a similar variation of EEPFs to the EEPFs from experiments. In addition, we measured the EEPFs along axial positions and the variation of electron temperature with respect to the ratio of O2 and Ar is opposite at low and high pressures, regardless of spatial positions. This result indicates that the opposite trend of electron temperature variation is mainly affected by the gas mixing ratio and gas pressure.