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Atomic layer deposition of highly conductive indium oxide using a liquid precursor and water oxidant Go to Link

Maeng, W. J.; Choi, Dong-won; Park, Jozeph; Park, Jin-Seong

ArticleIssue Date2015CitationCeramics International, v.41, no.9, pp 10782 - 10787PublisherElsevier

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Effect of Al concentration on the electrical characteristics of solution-processed Al doped ZnSnO thin film transistors Go to Link

Jeon, Hye-Ji; Maeng, W. J.; Park, Jin-Seong

ArticleIssue Date2014CitationCeramics International, v.40, no.6, pp 8769 - 8774PublisherElsevier

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Growth characteristics and film properties of gallium doped zinc oxide prepared by atomic layer deposition Go to Link

Maeng, W. J.; Park, Jin-Seong

ArticleIssue Date2013CitationJournal of Electroceramics, v.31, no.3-4, pp 338 - 344PublisherKluwer Academic Publishers

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Indium oxide thin film prepared by low temperature atomic layer deposition using liquid precursors and ozone oxidant Go to Link

Maeng, W. J.; Choi, Dong-Won; Park, Jozeph; Park, Jin-Seong

ArticleIssue Date2015CitationJournal of Alloys and Compounds, v.649, pp 216 - 221PublisherElsevier BV

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The conducting tin oxide thin films deposited via atomic layer deposition using Tetrakis-dimethylamino tin and peroxide for transparent flexible electronics Go to Link

Choi, Dong-won; Maeng, W. J.; Park, Jin-Seong

ArticleIssue Date2014CitationApplied Surface Science, v.313, pp 585 - 590PublisherElsevier BV

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Browsing by Maeng, W. J.Author

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