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Enabling scalable ferroelectric-based future generation vertical NAND flash with bonding-friendly architecture: strategies for erase and disturb optimizationGo to Linkopen access

Song, Ickhyun; Kim, Juhyun; Lee, Seungmin; Myeong, Ilho

ArticleIssue Date2026CitationNANOSCALE ADVANCES, v.8, no.4, pp 1240 - 1250PublisherROYAL SOC CHEMISTRY
SCIE
Energy-efficient hybrid-mode synapse combining high-speed volatile learning and long-term weight retentionGo to Link

Lee, Jun; Hwang, Eungi; Kim, Hyungjin; Baek, Myung-Hyun; Myeong, Ilho; Kim, Garam

ArticleIssue Date2026CitationSEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.41, no.2, pp 1 - 14PublisherIOP Publishing Ltd
SCIESCOPUS
Front-Side NMOS Connection as the Preferred Scheme: Quantifying the ~10× Resistance Limit of NMOS-Backside in DBC 3DSFET SRAMGo to Linkopen access

Shin, Yunho; Kang, Duckseoung; Kwon, Daewoong; Myeong, Ilho

ArticleIssue Date2026CitationIEEE ACCESS, v.14, pp 27374 - 27380PublisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
SCOPUS
Impact of MOSFET source/drain resistance on channel thermal noise calculation and noise performanceGo to Linkopen access

Jeong, Junhwa; Myeong, Ilho; Song, Ickhyun

ArticleIssue Date2026CitationResults in Physics, v.84, pp 1 - 9PublisherElsevier B.V.
SCOPUS
In-depth Analysis of the Hafnia Ferroelectrics as a Key Enabler for Low Voltage & QLC 3D VNAND beyond 1K Layers: Experimental Demonstration and ModelingGo to Link

Kim, Giuk; Choi, Hyojun; Shin, Hunbeom; Lee, Sangho; Lee, Sangmok; Nam, Yunseok; Jung, Minhyun; Myeong, Ilho; Kim, Kijoon; Woo, Jongho, et al.

ArticleIssue Date2024CitationDigest of Technical Papers - Symposium on VLSI Technology, pp 1 - 2
SCIESCOPUS
The Impact of Through Silicon Metal(TSM) contact on Performance and thermal reliability in CFETGo to Link

Shin, Yunho; Kwak, Been; Myeong, Ilho; Kwon, Daewoong

ArticleIssue Date2025CitationIEEE Electron Device Letters, v.46, no.10, pp 1897 - 1900PublisherInstitute of Electrical and Electronics Engineers
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