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Browsing by Park, Jin-HyungAuthor

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SCISCIESCOPUS
Chemical Mechanical Planarization Mechanism for Nitrogen-Doped Polycrystalline Ge2Sb2Te5 Film Using Nitric Acidic Slurry Added with Hydrogen PeroxideGo to Link

Cui, Hao; Cho, Jong-Young; Park, Jin-Hyung; Park, Hyung Soon; Park, Jea-Gun

ArticleIssue Date2011CitationJournal of the Electrochemical Society, v.158, no.6, pp H666 - H670PublisherElectrochemical Society, Inc.
SCIESCOPUS
Corrosion Inhibitors in Sodium Periodate Slurry for Chemical Mechanical Planarization of Ruthenium FilmGo to Link

Cui, Hao; Park, Jin-Hyung; Park, Jea-Gun

ArticleIssue Date2013CitationECS Journal of Solid State Science and Technology, v.2, no.3, pp P71 - P75PublisherElectrochemical Society, Inc.
SCIESCOPUS
Dishing-free chemical mechanical planarization for copper filmsGo to Link

Yun, Sang-Su; Son, Young-Hye; Jeong, Gi-ppeum; Lee, Je-hwan; Jeong, Jong-han; Bae, Jae-Young; Kim, Sung-In; Park, Jin-Hyung; Park, Jea Gun

ArticleIssue Date2021CitationColloids and Surfaces A: Physicochemical and Engineering Aspects, v.616, pp.1 - 15PublisherElsevier B.V.
SCIESCOPUS
Effect of abrasive material properties on polishing rate selectivity of nitrogen-doped Ge2Sb2Te5 to SiO2 film in chemical mechanical polishingGo to Link

Park, Jin-Hyung; Clu, Hao; Yi, Sok-Ho; Park, Jea-Gun; Paik, Ungyu

ArticleIssue Date2008CitationJournal of Materials Research, v.23, no.12, pp 3323 - 3329PublisherMaterials Research Society
SCIESCOPUS
Effect of alkaline agent on polishing rate of nitrogen-doped Ge2Sb2Te5 film in chemical mechanical polishingGo to Link

Park, Jin-Hyung; Cho, Jong-Young; Hwang, Hee-Sub; Paik, Ungyu; Park, Jea-Gun

ArticleIssue Date2007CitationElectrochemical and Solid-State Letters, v.11, no.10, pp H288 - H291PublisherElectrochemical Society, Inc.
SCOPUS
Effect of alkaline agent with organic additive in colloidal silica slurry on polishing rate selectivity of polysilicon-to-SiO2 in polysilicon CMPGo to Link

Hwang, Hee-Sub; Kang, Hyun-Goo; Park, Jin-Hyung; Paik, Ungyu; Park, Hyung-Soon; Park, Jea-Gun

ArticleIssue Date2008CitationECS Transactions, v.13, no.4, pp 67 - 73PublisherElectrochemical Society, Inc.
SCIESCOPUS
Effect of beta-cyclodextrin and Citric Acid on Chemical Mechanical Polishing of Polycrystalline Ge2Sb2Te5 in H2O2 Containing SlurryGo to Link

Cho, Jong-Young; Hwang, Hee-Sub; Woo, Sang-Hwa; Park, Jin-Hyung; Hwang, Eung-Rim; Kang, Sung-Goon; Park, Jea-Gun

ArticleIssue Date2013CitationECS Journal of Solid State Science and Technology, v.2, no.7, pp P299 - P304PublisherElectrochemical Society, Inc.
SCOPUS
Effect of characteristics of nano-colloidal silica abrasives on wafer surface roughness for wafer touch polishingGo to Link

Park, Jin-Hyung; Paik, Ungyu; Park, Jea-Gun

ArticleIssue Date2007CitationSolid State Phenomena, v.121-123, no.PART 2, pp 1229 - 1232PublisherScitec Publications Ltd.
SCISCIESCOPUS
Effect of Hydroxyethyl Cellulose Concentration on Surface Qualities of Silicon Wafer after Touch Polishing ProcessGo to Link

Hwang, Hee-Sub; Lim, Jae-Hyung; Park, Jin-Hyung; Choi, Eun-Suck; Ahn, Jin-Woo; Park, Jea-Gun

ArticleIssue Date2010CitationElectrochemical and Solid-State Letters, v.13, no.5, pp H147 - H150PublisherElectrochemical Society, Inc.
SCISCIESCOPUS
Effect of iron(III) nitrate concentration on tungsten chemical-mechanical-planarization performanceGo to Link

Lim, Jae-Hyung; Park, Jin-Hyung; Park, Jea-Gun

ArticleIssue Date2013CitationApplied Surface Science, v.282, pp 512 - 517PublisherElsevier BV
SCISCIESCOPUS
Effect of Molecular Weight of Polyvinylpyrrolidone on Corrosion-Inhibition Efficiency of Polycrystalline Ge2Sb2Te5 FilmGo to Link

Cho, Jong-Young; Yi, Sok-Ho; Park, Jin-Hyung; Park, Jea-Gun

ArticleIssue Date2012CitationJournal of the Electrochemical Society, v.159, no.4, pp H412 - H416PublisherElectrochemical Society, Inc.
SCISCIESCOPUS
Effect of NH4OH Concentration on Surface Qualities of a Silicon Wafer after Final-Touch PolishingGo to Link

Hwang, Hee-Sub; Park, Jin-Hyung; Choi, Eun-Suck; Ahn, Jin-Woo; Park, Jea-Gun

ArticleIssue Date2011CitationJournal of the Electrochemical Society, v.158, no.6, pp H641 - H644PublisherElectrochemical Society, Inc.
SCISCIESCOPUS
Effect of Nonionic Polymer as Corrosion Inhibitor in Alkaline Media for Polycrystalline Ge2Sb2Te5 Chemical Mechanical PlanarizationGo to Link

Cho, Jong-Young; Cui, Hao; Park, Jin-Hyung; Park, Hyung-Soon; Park, Jea-Gun

ArticleIssue Date2011CitationElectrochemical and Solid-State Letters, v.14, no.11, pp H450 - H452PublisherElectrochemical Society, Inc.
SCISCIESCOPUS
Effect of Organic Additive on Surface Roughness of Polycrystalline Silicon Film after Chemical Mechanical PolishingGo to Link

Hwang, Hee-Sub; Park, Jin-Hyung; Yi, Sok-Ho; Paik, Ungyu; Park, Jea-Gun

ArticleIssue Date2010CitationJapanese Journal of Applied Physics, v.49, no.1, pp 1 - 3PublisherIOP Publishing Ltd
SCOPUS
Effect of organic amine in colloidal silica slurry on polishing-rate selectivity of copper to tantalum-nitride film in copper chemical mechanical planarizationGo to Link

Park, Jin-Hyung; Cui, Hao; Hwang, Hee-Sub; Paik, Ungyu; Park, Hyung-Soon; Park, Jea-Gun

ArticleIssue Date2008CitationECS Transactions, v.13, no.4, pp 51 - 57PublisherElectrochemical Society, Inc.
SCIESCOPUS
Effect of Oxidizers on Chemical Mechanical Planarization of Ruthenium with Colloidal Silica Based SlurryGo to Link

Cui, Hao; Park, Jin-Hyung; Park, Jea-Gun

ArticleIssue Date2013CitationECS Journal of Solid State Science and Technology, v.2, no.1, pp P26 - P30PublisherElectrochemical Society, Inc.
SCISCIESCOPUS
Effect of Potassium Ferricyanide in the Acid Solution on Performance of Tungsten Chemical Mechanical PlanarizationGo to Link

Lim, Jae-Hyung; Park, Jin-Hyung; Park, Jea-Gun

ArticleIssue Date2012CitationJournal of the Electrochemical Society, v.159, no.4, pp H363 - H366PublisherElectrochemical Society, Inc.
SCIESCOPUS
Effects of Hydrolysis Reaction and Abrasive Drag Force Accelerator on Enhancing Si-Wafer Polishing Rate and Improving Si-Wafer Surface RoughnessGo to Linkopen access

Jeon, Min-Uk; Kim, Pil-Su; Han, Man-Hyup; Lee, Se-Hui; Lee, Hye-Min; Kim, Su-Bin; Park, Jin-Hyung; Cho, Kyoo-Chul; Park, Jinsub; Park, Jea-Gun

ArticleIssue Date2025CitationNanomaterials, v.15, no.16, pp 1 - 23PublisherMDPI
SCISCIESCOPUS
Environmentally clean slurry using nano-TiO2-abrasive mixed with oxidizer H2O2 for ruthenium-film chemical mechanical planarizationGo to Link

Cui, Hao; Park, Jin-Hyung; Park, Jea-Gun

ArticleIssue Date2013CitationApplied Surface Science, v.282, pp 844 - 850PublisherElsevier BV
SCIESCOPUS
Fenton Reaction for Enhancing Polishing Rate and Protonated Amine Functional Group Polymer for Inhibiting Corrosion in Ge1Sb4Te5 Film Surface Chemical-Mechanical-PlanarizationGo to Linkopen access

Jeong, Gi-Ppeum; Son, Young-Hye; Park, Jun-Seong; Kim, Pil-Su; Han, Man-Hyup; Hong, Seong-Wan; Park, Jin-Hyung; Cui, Hao; Yoon, Bo-Un; Park, Jea-Gun

ArticleIssue Date2021CitationAPPLIED SCIENCES-BASEL, v.11, no.22, pp.1 - 14PublisherMDPI
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