Effect of Molecular Weight of Polyvinylpyrrolidone on Corrosion-Inhibition Efficiency of Polycrystalline Ge2Sb2Te5 Film
- Authors
- Cho, Jong-Young; Yi, Sok-Ho; Park, Jin-Hyung; Park, Jea-Gun
- Issue Date
- Jan-2012
- Publisher
- ELECTROCHEMICAL SOC INC
- Citation
- JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.159, no.4, pp.H412 - H416
- Indexed
- SCIE
SCOPUS
- Journal Title
- JOURNAL OF THE ELECTROCHEMICAL SOCIETY
- Volume
- 159
- Number
- 4
- Start Page
- H412
- End Page
- H416
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/166545
- DOI
- 10.1149/2.032204jes
- ISSN
- 0013-4651
- Abstract
- As for chemical mechanical polishing (CMP) of polycrystalline Ge2Sb2Te5 (pc-GST), the corrosion-inhibition efficiency and polishing rate of 1-vinyl-2-pyrrolidinone (VP) and polyvinyl pyrrolidone (PVP) with molecular weights of 3.5 k, 25 k, and 1300 k g/mol were estimated. The estimation results show that there is an optimal molecule weight of the corrosion inhibitor (i.e., 3.5 k g/mol) to achieve free of corrosion pits and the lowest surface roughness after polishing test. These results demonstrate that the formation of a uniform polymeric passivation layer arising from a corrosion inhibitor can prevent a direct penetration of the oxidizer H2O2 at the optimum molecule weight of the corrosion inhibitor during the pc-GST CMP.
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